H2O MW 18.02 FP 0.0°C BP 100.0°C d 1.00 CAS [7732-18-5]
Residue <0.00005%
Resistivity (at time of manufacture) >18 MOhm @ 25°C
pH (at time of manufacture) 5.5-8.0 @ 25°C
TOC (at time of manufacture) <10 ppb
Gradient Use Test: 205nm <0.002 AU; 254nm <0.0005 AU
Baseline drift <0.02 AU @ 205nm
Suitability for LC-MS passes test
Trace ionic impurities:
Ag, Cu, Fe, K, Mg, Mn, Ni, Pb, Zn <10 ppb each
Al, Ca <25 ppb each
Na <50 ppb
Filtered to 0.2 micron
Application: HPLC critical gradient applications, LC-MS, UHPLC
